Photomask Fabrication Technology by Benjamin G. Eynon & Banqiu Wu

Photomask Fabrication Technology

By

  • Genre Engineering
  • Publisher McGraw Hill Professional
  • Released
  • Size 11.16 MB
  • Length 589 Pages

Description

Photomasks, the printing masters for the fabrication of integrated circuits, have become a necessity of modern semiconductor manufacturing. This book details the science and technology of industrial photo mask production, including fundamental principles, industrial production flows, and technological evolution.

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